公开(公告)号：US20150036259A1

公开(公告)日：2015-02-05

申请号：US14451139

申请日：2014-08-04

Applicant: Applied Materials, Inc.

Inventor： Michael S. COX ,  Lara HAWRYLCHAK ,  Steven V. SANSONI

IPC: H01L21/683

CPC classification number: H01L21/6833 ,  Y10T29/49815

Abstract: Embodiments described herein generally relate to an electrostatic chuck (ESC). The ESC may contain a first plurality of electrodes adapted to electrostatically couple a substrate to the ESC and a second plurality of electrodes adapted to electrostatically couple the ESC to a substrate support. Instead of being integrally disposed within the substrate support, the ESC may be easily removed from the substrate support and removed from a chamber for maintenance or replacement purposes.

Abstract translation: 本文描述的实施例一般涉及静电卡盘（ESC）。 ESC可以包含适于将基板静电耦合到ESC的第一多个电极和适于使ESC与基板支撑件静电耦合的第二多个电极。 代替整体地设置在基板支撑件内，ESC可以容易地从基板支撑件移除并从腔室移除以进行维护或替换。

公开(公告)号：US20180155838A1

公开(公告)日：2018-06-07

申请号：US15421964

申请日：2017-02-01

Applicant: APPLIED MATERIALS, INC.

Inventor： Muhammad M. RASHEED ,  Muhannad MUSTAFA ,  Hamid TAVASSOLI ,  Steven V. SANSONI ,  Cheng-Hsiung TSAI ,  Vikash Banthia

IPC: C23C16/46 ,  H01L21/67 ,  H01L21/687 ,  H01L21/683

CPC classification number: C23C16/46 ,  C23C16/4584 ,  C23C16/4586 ,  H01L21/67103 ,  H01L21/67248 ,  H01L21/6831 ,  H01L21/68735 ,  H01L21/68742 ,  H01L21/68785

Abstract: Embodiments of the present disclosure are directed process kits for use with an in-chamber heater and substrate rotating mechanism. In some embodiments consistent with the present disclosure, a process kit for use with a rotatable substrate support heater pedestal for supporting a substrate in a process chamber may include an upper edge ring including a top ledge and a skirt the extends downward from the top ledge, a lower edge ring that at least partially supports the upper edge ring and aligns the upper edge ring with the substrate support heater pedestal, a bottom plate disposed on a bottom of the process chamber that supports the upper edge ring when the substrate support heater pedestal is in a lowered non-processing position, and a shadow ring that couples with the upper edge ring when the substrate support heater pedestal is in a raised processing position.

公开(公告)号：US20170062260A1

公开(公告)日：2017-03-02

申请号：US15353499

申请日：2016-11-16

Applicant: Applied Materials, Inc.

Inventor： Michael S. COX ,  Lara HAWRYLCHAK ,  Steven V. SANSONI

IPC: H01L21/683

CPC classification number: H01L21/6833 ,  Y10T29/49815

Abstract: Embodiments described herein generally relate to an electrostatic chuck (ESC). The ESC may contain a first plurality of electrodes adapted to electrostatically couple a substrate to the ESC and a second plurality of electrodes adapted to electrostatically couple the ESC to a substrate support. Instead of being integrally disposed within the substrate support, the ESC may be easily removed from the substrate support and removed from a chamber for maintenance or replacement purposes.

Abstract translation: 本文描述的实施例一般涉及静电卡盘（ESC）。 ESC可以包含适于将基板静电耦合到ESC的第一多个电极和适于使ESC与基板支撑件静电耦合的第二多个电极。 代替整体地设置在基板支撑件内，ESC可以容易地从基板支撑件移除并从腔室移除以进行维护或替换。