METHOD OF INSPECTING SAPPHIRE STRUCTURES AND METHOD OF FORMING THE SAME
    1.
    发明申请
    METHOD OF INSPECTING SAPPHIRE STRUCTURES AND METHOD OF FORMING THE SAME 有权
    检查SAPPHIRE结构的方法及其形成方法

    公开(公告)号:US20150226723A1

    公开(公告)日:2015-08-13

    申请号:US14175845

    申请日:2014-02-07

    Applicant: APPLE INC.

    CPC classification number: G01N33/385 G01B21/20 G01N21/958

    Abstract: A method of inspecting and forming sapphire structures. The method of inspecting a sapphire structure may include may include providing an annealed sapphire structure, and measuring a profile of at least a portion of the annealed sapphire structure. The profile of at least the portion of the annealed sapphire structure may be measured using a non-x-ray based measuring device. Additionally, the method of inspecting may include identifying a defect within at least a portion of the measured profile of the annealed sapphire structure.

    Abstract translation: 检查和形成蓝宝石结构的方法。 检查蓝宝石结构的方法可以包括提供退火的蓝宝石结构,以及测量退火蓝宝石结构的至少一部分的轮廓。 可以使用非基于X射线的测量装置来测量退火蓝宝石结构的至少部分的轮廓。 另外,检查方法可以包括识别退火蓝宝石结构的测量轮廓的至少一部分内的缺陷。

Patent Agency Ranking