Invention Grant
- Patent Title: Process for producing substrate having wiring, radiation-sensitive composition, electronic circuit and electronic device
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Application No.: US15262404Application Date: 2016-09-12
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Publication No.: US09980392B2Publication Date: 2018-05-22
- Inventor: Hitoshi Hamaguchi , Kenrou Tanaka , Kenzou Ookita , Keisuke Kuriyama
- Applicant: JSR CORPORATION
- Applicant Address: JP Tokyo
- Assignee: JSR CORPORATION
- Current Assignee: JSR CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2014-052235 20140314
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/36 ; G03F7/40 ; H03K3/10 ; H05K3/12 ; H05K3/10 ; G03F7/004 ; G03F7/027 ; G03F7/20

Abstract:
A process for producing a substrate having wiring includes steps (i) to (v) described as follows: (i) applying a radiation-sensitive composition on a substrate to form a coating film; (ii) irradiating a prescribed part of the coating film with radiation to allow the coating film to have a radiation-irradiated region and a radiation-unirradiated region; (iii) allowing the coating film obtained in the step (ii) to have a concave region and a convex region; (iv) forming wiring on the concave region; and (v) removing the convex region by an application of radiation or by heating.
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Information query
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