- 专利标题: Nano vacuum gap device with a gate-all-around cathode
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申请号: US15098108申请日: 2016-04-13
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公开(公告)号: US09953796B2公开(公告)日: 2018-04-24
- 发明人: Biqin Huang , Christopher S. Roper , Tahir Hussain
- 申请人: HRL Laboratories, LLC
- 申请人地址: US CA Malibu
- 专利权人: HRL Laboratories, LLC
- 当前专利权人: HRL Laboratories, LLC
- 当前专利权人地址: US CA Malibu
- 代理机构: Ladas & Parry
- 主分类号: H01J1/62
- IPC分类号: H01J1/62 ; H01J1/308 ; H01J1/304 ; H01J9/02 ; H01J21/10
摘要:
A semiconductor power handling device, includes a cathode pillar, a gate surrounding the cathode pillar, and an anode spaced from the cathode by a nano-vacuum gap. An array of semiconductor power handling devices, each comprising a cathode pillar, a gate surrounding the cathode pillar, and an anode spaced from the cathode pillar by a nano-vacuum gap. The semiconductor power handling devices can be arranged as rows and columns and can be interconnected to meet the requirements of various applications. The array of power handling devices can be fabricated on a single substrate.
公开/授权文献
- US20160307722A1 NANO VACUUM GAP DEVICE WITH A GATE-ALL-AROUND CATHODE 公开/授权日:2016-10-20
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