- 专利标题: Semiconductor memory device and method for manufacturing the same
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申请号: US15201935申请日: 2016-07-05
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公开(公告)号: US09852942B2公开(公告)日: 2017-12-26
- 发明人: Wataru Sakamoto , Hideki Inokuma , Osamu Matsuura
- 申请人: Toshiba Memory Corporation
- 申请人地址: JP Minato-ku
- 专利权人: TOSHIBA MEMORY CORPORATION
- 当前专利权人: TOSHIBA MEMORY CORPORATION
- 当前专利权人地址: JP Minato-ku
- 代理机构: Oblon, McClelland, Maier & Neustadt, L.L.P.
- 主分类号: H01L21/00
- IPC分类号: H01L21/00 ; H01L21/768 ; H01L27/11568 ; H01L27/11582
摘要:
According to one embodiment, a semiconductor memory device includes a substrate, a stacked body, and a plurality of columnar parts. The stacked body is provided on the substrate. The stacked body includes a plurality of electrode films stacked separately from each other. The plurality of columnar parts is provided in the stacked body. Each of the plurality of columnar parts includes a semiconductor pillar extending in a stacking direction of the stacked body, and a charge storage film provided between the semiconductor pillar and the stacked body. The plurality of electrode films includes a first electrode film provided in upper layers of the stacked body and a second electrode film provided in lower layers of the stacked body. A thickness of the first electrode film is thicker than a thickness of the second electrode film. The first electrode film is provided with a void.
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