- 专利标题: Method for forming wiring
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申请号: US15125037申请日: 2015-03-05
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公开(公告)号: US09832886B2公开(公告)日: 2017-11-28
- 发明人: Daisuke Kumaki , Shizuo Tokito , Yu Kobayashi , Shohei Norita
- 申请人: National University Corporation Yamagata University
- 申请人地址: JP Yamagata
- 专利权人: NATIONAL UNIVERSITY CORPORATION YAMAGATA UNIVERSITY
- 当前专利权人: NATIONAL UNIVERSITY CORPORATION YAMAGATA UNIVERSITY
- 当前专利权人地址: JP Yamagata
- 代理机构: Hamre, Schumann, Mueller & Larson, P.C.
- 优先权: JP2014-047549 20140311
- 国际申请: PCT/JP2015/001198 WO 20150305
- 国际公布: WO2015/136900 WO 20150917
- 主分类号: H05K3/00
- IPC分类号: H05K3/00 ; H05K3/40 ; H05K3/10 ; H01L23/522 ; H05K1/09 ; H01L21/768
摘要:
A method for forming a wiring according to the present invention includes: applying an ink (6) that exhibits electrical conductivity upon light absorption to a contact hole formation portion of an upper face of an insulating resin layer (3) formed on a lower wiring element (2); and irradiating the ink (6) with light to render the ink (6) conductive and also to remove a part of the insulating resin layer (3) by heat emitted from the ink (6) so as to form a contact hole (5), the part of the insulating resin layer (3) lying under the portion of the face to which the ink (6) is applied. A step of forming an upper wiring element (4) on the upper face of the insulating resin layer (3) may further be carried out, the upper wiring element (4) being electrically continuous with the lower wiring element (2) through the contact hole (5).
公开/授权文献
- US20170020006A1 METHOD FOR FORMING WIRING 公开/授权日:2017-01-19
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