发明授权
- 专利标题: Microlithographic apparatus and method of varying a light irradiance distribution
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申请号: US14851107申请日: 2015-09-11
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公开(公告)号: US09720336B2公开(公告)日: 2017-08-01
- 发明人: Holger Walter , Alexander Wolf
- 申请人: Carl Zeiss SMT GmbH
- 申请人地址: DE Oberkochen
- 专利权人: Carl Zeiss SMT GmbH
- 当前专利权人: Carl Zeiss SMT GmbH
- 当前专利权人地址: DE Oberkochen
- 代理机构: Fish & Richardson P.C.
- 主分类号: G03B27/54
- IPC分类号: G03B27/54 ; G03F7/20 ; G02B27/58
摘要:
A microlithographic apparatus includes an objective that includes a transmission filter that is configured to variably modify a light irradiance distribution in a projection light path. The transmission filter includes a plurality of gas outlet apertures that are configured to emit gas flows that pass through a space through which projection light propagates during operation of the microlithographic apparatus. The transmission filter further includes a control unit which is configured to vary a number density of ozone molecules in the gas flows individually for each gas flow. In this manner it is possible to finally adjust the transmittance distribution of the transmission filter.
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