- 专利标题： Stage apparatus, lithography apparatus, method of manufacturing an article, and determination method
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申请号： US14740705申请日： 2015-06-16
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公开(公告)号： US09720334B2公开(公告)日： 2017-08-01
- 发明人: Satoshi Maruyama , Mitsuo Hirata
- 申请人： CANON KABUSHIKI KAISHA
- 申请人地址： JP Tokyo
- 专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人地址： JP Tokyo
- 代理机构： Rossi, Kimms & McDowell LLP
- 优先权： JP2014-124684 20140617
- 主分类号： G03B27/42
- IPC分类号： G03B27/42 ; G03B27/58 ; G03B27/62 ; G03F7/20
摘要：
The present invention provides a stage apparatus including a stage being movable, comprising a driving unit configured to drive the stage by providing thrust to the stage, a measuring unit configured to measure a position of the stage, and a control unit configured to control the position of the stage by supplying, to the driving unit, a signal composed of a first signal for reducing a deviation between a current position of the stage and a target position, and a second signal for reducing vibration of the stage caused by a thrust ripple included in the thrust.
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