Invention Grant
- Patent Title: Apparatus for measuring overlay errors
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Application No.: US15136855Application Date: 2016-04-22
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Publication No.: US09702693B2Publication Date: 2017-07-11
- Inventor: Mark Ghinovker , Michael Adel , Walter D. Mieher , Ady Levy , Dan Wack
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Kwan & Olynick LLP
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G01B11/27 ; G01N21/47 ; G01N21/95 ; H01L21/68 ; H01L23/544

Abstract:
A metrology system for determining overlay is disclosed. The system includes an optical assembly for capturing images of an overlay mark and a computer for analyzing the captured images to determine whether there is an overlay error. The mark comprises first and second regions that each include at least two separately generated working zones, juxtaposed relative to one another, configured to provide overlay information in a first direction, and include a periodic structure having coarsely segmented elements. The mark comprises third and fourth regions that each include at least two separately generated working zones, juxtaposed relative to one another, configured to provide overlay information in a second direction, and include a periodic structure having coarsely segmented elements. Working zones of the first and second regions are diagonally opposed and spatially offset relative to one another, and the working zones of the third and fourth regions are diagonally opposed and spatially offset relative to one another.
Public/Granted literature
- US20160313116A1 APPARATUS FOR MEASURING OVERLAY ERRORS Public/Granted day:2016-10-27
Information query
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