Invention Grant
- Patent Title: Liquid processing apparatus
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Application No.: US14784164Application Date: 2014-02-20
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Publication No.: US09663391B2Publication Date: 2017-05-30
- Inventor: Naoki Yoshikawa , Shuji Nakanishi , Yuya Suzuki
- Applicant: Panasonic Intellectual Property Management Co., Ltd.
- Applicant Address: JP Osaka
- Assignee: Panasonic Intellectual Property Management Co., Ltd.
- Current Assignee: Panasonic Intellectual Property Management Co., Ltd.
- Current Assignee Address: JP Osaka
- Agency: Renner, Otto, Boisselle & Sklar, LLP
- Priority: JP2013-089405 20130422
- International Application: PCT/JP2014/000873 WO 20140220
- International Announcement: WO2014/174742 WO 20141030
- Main IPC: C02F3/10
- IPC: C02F3/10 ; H01M8/16 ; C02F3/00 ; C02F3/28 ; C02F1/461 ; C02F101/16

Abstract:
A liquid treatment device (100) including: a structure (10) having a first surface (10a) and a second surface (10b), the structure including: a conductor (11) arranged between the first surface (10a) and the second surface (10b), the conductor including a first portion (11a) exposed to outside at the first surface (10a) and a second portion (11b) exposed to outside at the second surface (10b), and the conductor electrically connecting the first portion (11a) and the second portion (11b); and an ion transfer layer (15) arranged between the first surface (10a) and the second surface (10b), the ion transfer layer (15) arranged between the first surface (10a) and the second surface (10b), allowing hydrogen ions to move therethrough; and a first treatment tank (12) for holding a first liquid to be treated (17) therein, wherein the first surface (10a) of the structure (10) is located inside the first treatment tank (12).
Public/Granted literature
- US20160052810A1 LIQUID PROCESSING APPARATUS Public/Granted day:2016-02-25
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