Low cost high performance EEPROM device
摘要:
Devices and methods for forming a device are presented. The method includes providing a substrate prepared with a cell area separated by other active areas by isolation regions. First and second lower sub-gates of first and second transistors are formed in the cell area. A common upper sub-gate of the first and second transistors is formed. The common upper sub-gate and first and second lower sub-gates are separated by an intergate dielectric layer and the common upper sub-gate surrounds the first and second lower sub-gates.
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