- 专利标题: Plug application and removal device and sample processing device
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申请号: US14240087申请日: 2012-08-22
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公开(公告)号: US09630181B2公开(公告)日: 2017-04-25
- 发明人: Yoshihiro Nagaoka , Kenichi Takahashi , Toshiki Yamagata , Shigeki Yamaguchi
- 申请人: Yoshihiro Nagaoka , Kenichi Takahashi , Toshiki Yamagata , Shigeki Yamaguchi
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Mattingly & Malur, PC
- 优先权: JP2011-180099 20110822
- 国际申请: PCT/JP2012/071134 WO 20120822
- 国际公布: WO2013/027747 WO 20130228
- 主分类号: B01L3/00
- IPC分类号: B01L3/00 ; G01N35/04 ; B67C3/24 ; B01L3/02 ; G01N35/10
摘要:
The present invention is such a plug application and removal device that mist which is generated upon plug removal of a sample container or a reagent container is not peripherally scattered, or is such a sample processing device that mist which is generated upon dispensing of a sample or a reagent into a container is not mixed to another container. A plug application and removal device has a container holding mechanism that holds a container housing liquid inside and applied with a plug, and has a plug application and removal mechanism that removes or applies the plug from/to the container. The plug application and removal device has: a control mechanism for controlling movement of liquid or mist spilled out of the container upon a process of removal or application of the plug by the plug application and removal mechanism.
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