Salt, resin, resist composition and method for producing resist pattern
摘要:
A salt represented by the formula (I); wherein Q1 and Q2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, Lb1 represents a single bond or a divalent C1 to C24 saturated hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group and where a hydrogen atom may be replaced by a hydroxyl group or a fluorine atom, and Y represents a hydrogen atom, a fluorine atom, or an optionally substituted C3 to C18 alicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom, a carbonyl group or a sulfonyl group; and Ar represents a divalent C6 to C20 aromatic hydrocarbon group, and Z+ represents an organic sulfonium cation or an organic iodonium cation.
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