The present disclosure provides methods of electron-beam (e-beam) lithography process. The method includes loading a substrate to an electron-beam (e-beam) system such that a first subset of fields defined on the substrate is arrayed on the substrate along a first direction. The method also includes positioning a plurality of e-beam columns having a first subset of e-beam columns arrayed along the first direction. The e-beam columns of the first subset of e-beam columns are directed to different ones of the first subset of fields. The method also includes performing a first exposing process in a scan mode such that the plurality of e-beam columns scans the substrate along the first direction.