Invention Grant
- Patent Title: High moment side shield design for area density improvement of perpendicular magnetic recording (PMR) writer
- Patent Title (中): 垂直磁记录(PMR)作者的面积密度改善的高矩侧面设计
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Application No.: US15162091Application Date: 2016-05-23
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Publication No.: US09589582B2Publication Date: 2017-03-07
- Inventor: Yue Liu , Atsushi Yamaguchi , Yuhui Tang , Jiun-Ting Lee , Yaguang Wei , Xiaomin Liu , Hideyuki Ukita , Moris Dovek , Michitaka Nishiyama
- Applicant: Headway Technologies, Inc. , TDK Corporation
- Applicant Address: US CA Milpitas JP Tokyo
- Assignee: Headway Technologies, Inc.,TDK Corporation
- Current Assignee: Headway Technologies, Inc.,TDK Corporation
- Current Assignee Address: US CA Milpitas JP Tokyo
- Agency: Saile Ackerman LLC
- Agent Stephen B. Ackerman
- Main IPC: G11B5/31
- IPC: G11B5/31 ; G11B5/60 ; G11B5/127

Abstract:
A PMR writer is disclosed wherein a hot seed layer (HS) made of a 19-24 kilogauss (kG) magnetic material is formed between a gap layer and a 10-16 kG magnetic layer in the side shields, and between the leading gap and a 16-19 kG magnetic layer in the leading shield to improve the track field gradient and cross-track field gradient while maintaining write-ability. The HS is from 10 to 100 nm thick and has a first side facing the write pole with a height of ≦0.15 micron, and a second side facing a main pole flared side that may extend to a full side shield height of ≦0.5 micron. The trailing shield has a second hot seed layer on the write gap and a 16-19 kG magnetic layer that contacts the 10-16 kG side shield magnetic layer thereby forming an all wrap around (AWA) shield configuration.
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