Invention Grant
US09534154B2 Semiconductor device using composition for anisotropic conductive adhesive film or anisotropic conductive adhesive film
有权
使用各向异性导电粘合膜或各向异性导电粘合膜的组合物的半导体器件
- Patent Title: Semiconductor device using composition for anisotropic conductive adhesive film or anisotropic conductive adhesive film
- Patent Title (中): 使用各向异性导电粘合膜或各向异性导电粘合膜的组合物的半导体器件
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Application No.: US13724219Application Date: 2012-12-21
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Publication No.: US09534154B2Publication Date: 2017-01-03
- Inventor: Jin Young Seo , Hyun Wook Kim , Hyun Hee Namkung , Kyung Il Sul , Dong Seon Uh , Kwang Jin Jung , Jae Sun Han
- Applicant: Jin Young Seo , Hyun Wook Kim , Hyun Hee Namkung , Kyung Il Sul , Dong Seon Uh , Kwang Jin Jung , Jae Sun Han
- Applicant Address: KR Gumi-Si, Gyeongsangbuk-do
- Assignee: Cheil Industries, Inc.
- Current Assignee: Cheil Industries, Inc.
- Current Assignee Address: KR Gumi-Si, Gyeongsangbuk-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2011-0142092 20111226
- Main IPC: H01B1/20
- IPC: H01B1/20 ; C09J9/00 ; C09J9/02 ; C09J123/08

Abstract:
An electronic device includes an anisotropic conductive adhesive film as a connection material, wherein the anisotropic conductive adhesive film has a flowability of 50% or more after preliminary pressing at 80° C. and 1 MPa for 1 second and final pressing at 180° C. and 3 MPa for 5 seconds, and a connection resistance increment greater than 0% but not greater than 25%, as calculated by Expression 1: Connection resistance increment (%)=|(A−B)/A|×100 (Expression 1) where A is a connection resistance measured after preliminary pressing at 80° C. and 1 MPa for 1 second and final pressing at 180° C. and 3 MPa for 5 seconds, and B is a connection resistance measured after reliability evaluation at a temperature of 85° C. and a humidity of 85% for 250 hours following preliminary pressing and final pressing.
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