Invention Grant
- Patent Title: Method for manufacturing nanostructure semiconductor light emitting device
- Patent Title (中): 制造纳米结构半导体发光器件的方法
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Application No.: US14764349Application Date: 2014-01-28
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Publication No.: US09525102B2Publication Date: 2016-12-20
- Inventor: Nam-Goo Cha , Geon-Wook Yoo , Han-Kyu Seong
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2013-0010110 20130129; KR10-2013-0164523 20131226
- International Application: PCT/KR2014/000811 WO 20140128
- International Announcement: WO2014/119910 WO 20140807
- Main IPC: H01L33/24
- IPC: H01L33/24 ; H01L33/08 ; H01L33/00 ; H01L33/20 ; H01L33/18

Abstract:
There is provided a method of manufacturing a nanostructure semiconductor light emitting device including providing a base layer formed of a first conductivity-type semiconductor, forming a mask including an etch stop layer on the base layer, forming a plurality of openings with regions of the base layer exposed therethrough, in the mask; forming a plurality of nanocores by growth of the first conductivity-type semiconductor on the exposed regions of the base layer to fill the plurality of openings, partially removing the mask using the etch stop layer to expose side portions of the plurality of nanocores, and sequentially growth of an active layer and a second conductivity-type semiconductor layer on surfaces of the plurality of nanocores.
Public/Granted literature
- US20150372186A1 METHOD FOR MANUFACTURING NANOSTRUCTURE SEMICONDUCTOR LIGHT EMITTING DEVICE Public/Granted day:2015-12-24
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