- 专利标题： Lithographic apparatus and device manufacturing method
-
申请号： US14806395申请日： 2015-07-22
-
公开(公告)号： US09507278B2公开(公告)日： 2016-11-29
- 发明人: Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik de Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Johannes Petrus Maria Smeulers , Stefan Philip Christiaan Belfroid , Herman Vogel
- 申请人： ASML NETHERLANDS B.V. , ASML HOLDING N.V.
- 申请人地址： NL Veldhoven NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.,ASML HOLDING N.V.
- 当前专利权人： ASML NETHERLANDS B.V.,ASML HOLDING N.V.
- 当前专利权人地址： NL Veldhoven NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03B27/52
- IPC分类号： G03B27/52 ; G03B27/42 ; G03F7/20
摘要：
A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
公开/授权文献
- US20150323876A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 公开/授权日：2015-11-12
信息查询
