发明授权
- 专利标题： Substrate holder and method of manufacturing a substrate holder
- 专利标题（中）： 基板支架及其制造方法
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申请号： US14373291申请日： 2013-01-17
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公开(公告)号： US09507274B2公开(公告)日： 2016-11-29
- 发明人: Raymond Wilhelmus Louis Lafarre , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg
- 申请人： ASML Netherlands B.V.
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 国际申请： PCT/EP2013/050826 WO 20130117
- 国际公布： WO2013/113569 WO 20130808
- 主分类号： G03B27/58
- IPC分类号： G03B27/58 ; G03F7/20 ; B23Q3/18 ; B05D3/06 ; B05D5/00 ; B23K26/00
摘要：
An object holder (100) for a lithographic apparatus has a main body (400) having a surface (400a). A plurality of burls (406) to support an object are formed on the surface or in apertures of a thin-film stack (410, 440, 450). At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.
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