发明授权
- 专利标题: Method of heating, method of producing piezoelectric film, and light irradiation device
- 专利标题(中): 加热方法,制造压电膜的方法和光照射装置
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申请号: US14160701申请日: 2014-01-22
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公开(公告)号: US09461239B2公开(公告)日: 2016-10-04
- 发明人: Xianfeng Chen
- 申请人: Xianfeng Chen
- 申请人地址: JP Tokyo
- 专利权人: Ricoh Company, Ltd.
- 当前专利权人: Ricoh Company, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: IPUSA, PLLC
- 优先权: JP2013-020389 20130205
- 主分类号: H01L41/314
- IPC分类号: H01L41/314 ; H01L41/318 ; H01L41/331 ; H01L41/09 ; H01L41/187
摘要:
A method of heating includes a process of forming a layer to be heated on one surface of a light absorption layer; and a process of heating the light absorption layer by irradiating light onto the other surface of the light absorption layer. The other surface of the light absorption layer is a surface opposite to the one surface of the light absorption layer.
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