发明授权
- 专利标题： Reflective mask blank and reflective mask, and methods for manufacturing reflective mask blank and reflective mask
- 专利标题（中）： 反光罩和反光罩，以及反光罩和反光罩的制造方法
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申请号： US14227705申请日： 2014-03-27
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公开(公告)号： US09448468B2公开(公告)日： 2016-09-20
- 发明人: Masahito Tanabe , Norihito Fukugami , Yo Sakata , Tooru Komizo , Takashi Haraguchi
- 申请人： TOPPAN PRINTING CO., LTD.
- 申请人地址： JP Tokyo
- 专利权人： TOPPAN PRINTING CO., LTD.
- 当前专利权人： TOPPAN PRINTING CO., LTD.
- 当前专利权人地址： JP Tokyo
- 优先权： JP2011-213244 20110928; JP2011-214573 20110929
- 主分类号： G03F1/24
- IPC分类号： G03F1/24 ; G03F1/22 ; G03F1/00
摘要：
A reflective mask blank, a reflective mask, and methods for manufacturing those, which suppress reflectance at a light-shielding frame. The reflective mask includes a substrate, a multilayered reflective layer formed on the substrate, an absorption layer formed on the multilayered reflective layer, and a frame-shaped light-shielding frame area at which the absorption layer has a film thickness larger than a film thickness at other areas. The multilayered reflective layer is diffused and mixed at the light-shielding frame area through melting.
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