发明授权
- 专利标题: Soluble graphene nanostructures and assemblies therefrom
- 专利标题(中): 可溶性石墨烯纳米结构及其组件
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申请号: US13520735申请日: 2011-01-07
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公开(公告)号: US09410040B2公开(公告)日: 2016-08-09
- 发明人: Liang-shi Li , Xin Yan
- 申请人: Liang-shi Li , Xin Yan
- 申请人地址: US IN Indianapolis
- 专利权人: Indiana University Research and Technology Corporation
- 当前专利权人: Indiana University Research and Technology Corporation
- 当前专利权人地址: US IN Indianapolis
- 代理机构: Barnes & Thornburg LLP
- 国际申请: PCT/US2011/020501 WO 20110107
- 国际公布: WO2011/085185 WO 20110714
- 主分类号: H01B1/04
- IPC分类号: H01B1/04 ; B82Y20/00 ; B82Y30/00 ; C09C1/44 ; C01B31/04
摘要:
Disclosed herein is a method for preparing large soluble graphenes. The method comprises attaching one or more hindering groups to the graphene, which can prevent face-to-face graphene stacking by reducing the effects of inter-graphene attraction. The large graphenes can absorb a wide spectrum of light from UV to near infrared, and are useful in photovoltaic devices and sensitizers in nanocrystalline solar cells.
公开/授权文献
- US20120279570A1 SOLUBLE GRAPHENE NANOSTRUCTURES AND ASSEMBLIES THEREFROM 公开/授权日:2012-11-08
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