发明授权
- 专利标题： Method for deposition of conformal films with catalysis assisted low temperature CVD
- 专利标题（中）： 用催化辅助低温CVD沉积保形膜的方法
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申请号： US13946012申请日： 2013-07-19
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公开(公告)号： US09388491B2公开(公告)日： 2016-07-12
- 发明人: Keith Fox
- 申请人： Novellus Systems, Inc.
- 申请人地址： US CA San Jose
- 专利权人： Novellus Systems, Inc.
- 当前专利权人： Novellus Systems, Inc.
- 当前专利权人地址： US CA San Jose
- 主分类号： C23C16/34
- IPC分类号： C23C16/34 ; C23C16/38 ; C23C16/32 ; C23C16/455
摘要：
A method for depositing a film in a substrate processing system includes arranging a substrate on a pedestal in a processing chamber, heating the substrate to a temperature within a predetermined temperature range, and supplying a gas mixture to the processing chamber for a predetermined period to deposit the film on the substrate, wherein the gas mixture includes a first precursor gas, ammonia gas and diborane gas.
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