发明授权
- 专利标题: Optical mask
- 专利标题(中): 光学面具
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申请号: US14668587申请日: 2015-03-25
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公开(公告)号: US09385347B2公开(公告)日: 2016-07-05
- 发明人: Joon Gu Lee , Yeon Hwa Lee , Jin Baek Choi , Young Gil Kwon
- 申请人: Samsung Display Co., Ltd.
- 申请人地址: KR Yongin-si
- 专利权人: Samsung Display Co., Ltd.
- 当前专利权人: Samsung Display Co., Ltd.
- 当前专利权人地址: KR Yongin-si
- 代理机构: H.C. Park & Associates, PLC
- 优先权: KR10-2014-0117017 20140903
- 主分类号: B41M5/40
- IPC分类号: B41M5/40 ; H01L51/56 ; C23C14/04 ; B41M5/48 ; B41M5/42 ; B41M5/46 ; H01L51/00
摘要:
An optical mask includes a light-to-heat conversion layer with an improved temperature profile. The optical masks may comprise a light-transmitting base substrate; a first reflective pattern layer which is formed on the light-transmitting base substrate comprising a first opening portion transmitting light emitted from under the light-transmitting base substrate and a first reflective portion reflecting the light; a second reflective pattern layer which is formed over the first opening portion comprising a second opening portion overlapping a first area of the first opening portion and a second reflective portion overlapping a second area of the first opening portion; and a light-to-heat conversion pattern layer which is formed on the light-transmitting base substrate, being disposed in the first area of the first opening portion, absorbing at least a part of the light, and converting the light absorbed into heat.
公开/授权文献
- US20160064698A1 OPTICAL MASK 公开/授权日:2016-03-03
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