Invention Grant
- Patent Title: Apparatus and method for scheduling of ray tracing
- Patent Title (中): 光线跟踪调度的装置和方法
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Application No.: US13902157Application Date: 2013-05-24
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Publication No.: US09367949B2Publication Date: 2016-06-14
- Inventor: Won Jong Lee , Young Sam Shin , Jae Don Lee
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: NSIP Law
- Priority: KR10-2012-0102709 20120917
- Main IPC: G06T15/06
- IPC: G06T15/06

Abstract:
A graphic processing apparatus and method for processing ray tracing may include a plurality of traversal units to process traversal of a ray. A management unit of the graphics processing apparatus may distribute data of the ray processed by the graphics processing apparatus to the plurality of traversal units. Each of the plurality of traversal units may process ray traversal with respect to a subdivision of the entire space.
Public/Granted literature
- US20140078143A1 APPARATUS AND METHOD FOR SCHEDULING OF RAY TRACING Public/Granted day:2014-03-20
Information query
IPC分类:
G | 物理 |
G06 | 计算;推算或计数 |
G06T | 一般的图像数据处理或产生 |
G06T15/00 | 3D〔三维〕图像的加工 |
G06T15/06 | .光线跟踪 |