发明授权
US09349582B2 Liquid chemical for forming water repellent protecting film, and process for cleaning wafers using the same
有权
用于形成防水保护膜的液体化学品，以及使用其的清洁晶片的方法
- 专利标题： Liquid chemical for forming water repellent protecting film, and process for cleaning wafers using the same
- 专利标题（中）： 用于形成防水保护膜的液体化学品，以及使用其的清洁晶片的方法
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申请号： US13458119申请日： 2012-04-27
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公开(公告)号： US09349582B2公开(公告)日： 2016-05-24
- 发明人: Soichi Kumon , Takashi Saio , Masanori Saito , Shinobu Arata
- 申请人： Soichi Kumon , Takashi Saio , Masanori Saito , Shinobu Arata
- 申请人地址： JP Ube-shi
- 专利权人： Central Glass Company, Limited
- 当前专利权人： Central Glass Company, Limited
- 当前专利权人地址： JP Ube-shi
- 代理机构： Crowell & Moring LLP
- 优先权： JP2011-101351 20110428; JP2011-102115 20110428; JP2012-079211 20120330; JP2012-079864 20120330
- 主分类号： C03C23/00
- IPC分类号： C03C23/00 ; C23G1/02 ; B08B7/00 ; B08B9/00 ; B08B3/00 ; H01L21/02 ; H01L21/321 ; C11D1/00 ; C11D1/04 ; C11D1/34 ; C11D1/40 ; C11D1/58 ; C11D3/20 ; C11D3/28 ; C11D3/34 ; C11D3/36 ; C11D3/43 ; C11D11/00
摘要：
A liquid chemical for forming a water repellent protecting film on a wafer having at its surface an uneven pattern and containing at least one kind of element selected from the group consisting of titanium, tungsten, aluminum, copper, tin, tantalum and ruthenium at surfaces of recessed portions of the uneven pattern, the water repellent protecting film being formed at least on the surfaces of the recessed portions. The liquid chemical is characterized by including: a water repellent protecting film forming agent; and water, and characterized in that the water repellent protecting film forming agent is at least one selected from compounds represented by the following general formula [1] and salt compounds thereof and that the concentration of the water relative to the total quantity of a solvent contained in the liquid chemical is not smaller than 50 mass %.
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