Invention Grant
US09343656B2 Magnetic tunnel junction (MTJ) structure in magnetic random access memory
有权
磁性随机存取存储器中的磁隧道结(MTJ)结构
- Patent Title: Magnetic tunnel junction (MTJ) structure in magnetic random access memory
- Patent Title (中): 磁性随机存取存储器中的磁隧道结(MTJ)结构
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Application No.: US13410714Application Date: 2012-03-02
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Publication No.: US09343656B2Publication Date: 2016-05-17
- Inventor: Kai-Wen Cheng , Chwen Yu , Chih-Ming Chen
- Applicant: Kai-Wen Cheng , Chwen Yu , Chih-Ming Chen
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater Matsil, LLP
- Main IPC: H01L29/82
- IPC: H01L29/82 ; H01L43/08

Abstract:
Methods and apparatuses for a magnetic tunnel junction (MTJ) which can be used in as a magnetic random access memory cell are disclosed. The MTJ comprises a free layer and an insulator layer. The MTJ further comprises a pinned layer with a first region, a second region, and a third region. The second region is of a first length and of a first thickness, and the first region and the third region are of a second length and of a second thickness. A ratio of the first thickness to the second thickness may be larger than 1.2. A ratio of the second length to the first length is larger than 0.5. The first thickness may be larger than a spin diffusion length of a material for the pinned layer. So formed MTJ results in increased tunneling magnetic resistance ratio and reduced critical switch current of the MTJ.
Public/Granted literature
- US20130228882A1 Magnetic Tunnel Junction (MTJ) Structure in Magnetic Random Access Memory Public/Granted day:2013-09-05
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