Invention Grant
US09340897B2 Method for controlling the diameter of a single crystal to a set point diameter
有权
用于将单晶体的直径控制到设定点直径的方法
- Patent Title: Method for controlling the diameter of a single crystal to a set point diameter
- Patent Title (中): 用于将单晶体的直径控制到设定点直径的方法
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Application No.: US14285752Application Date: 2014-05-23
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Publication No.: US09340897B2Publication Date: 2016-05-17
- Inventor: Thomas Schroeck
- Applicant: SILTRONIC AG
- Applicant Address: DE Munich
- Assignee: Siltronic AG
- Current Assignee: Siltronic AG
- Current Assignee Address: DE Munich
- Agency: Brooks Kushman P.C.
- Priority: DE102013210687 20130607
- Main IPC: C30B15/22
- IPC: C30B15/22 ; C30B29/00 ; C30B29/06 ; C30B15/26

Abstract:
The diameter of a single crystal is controlled to a set point diameter during pulling of the single crystal from a melt contained in a crucible and which forms a meniscus at a phase boundary on the edge of the single crystal, the meniscus having a height which corresponds to the distance between the phase boundary and a level of the surface of the melt outside the meniscus, comprising repeatedly: determining the diameter of a bright ring on the meniscus; calculating a diameter of the single crystal while taking into account the diameter of the bright ring and the dependency of the diameter of the bright ring on the height of the meniscus and on the diameter of the single crystal itself; and calculating at least one manipulated variable for controlling the diameter of the single crystal on the basis of the difference between the calculated diameter of the single crystal and the set point diameter of the single crystal.
Public/Granted literature
- US20140360425A1 Method For Controlling The Diameter Of A Single Crystal To A Set Point Diameter Public/Granted day:2014-12-11
Information query
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