Invention Grant
- Patent Title: Material including graphene and an inorganic material and method of manufacturing the material
- Patent Title (中): 材料包括石墨烯和无机材料及其制造方法
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Application No.: US12956964Application Date: 2010-11-30
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Publication No.: US09306099B2Publication Date: 2016-04-05
- Inventor: Jae-young Choi , Won-mook Choi , Duk-hyun Choi , Sang-woo Kim , Kyung-sik Shin
- Applicant: Jae-young Choi , Won-mook Choi , Duk-hyun Choi , Sang-woo Kim , Kyung-sik Shin
- Applicant Address: KR KR
- Assignee: SAMSUNG ELECTRONICS CO., LTD.,KUMOH NATIONAL INSTITUTE OF TECHNOLOGY INDUSTRY-ACADEMIC COOPERATION FOUNDATION
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.,KUMOH NATIONAL INSTITUTE OF TECHNOLOGY INDUSTRY-ACADEMIC COOPERATION FOUNDATION
- Current Assignee Address: KR KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2009-0117834 20091201; KR10-2010-0120515 20101130
- Main IPC: B32B9/00
- IPC: B32B9/00 ; H01L31/0352 ; C01B31/04 ; H01L31/036 ; H01L31/0392
Abstract:
A material including: graphene; and an inorganic material having a crystal system, wherein a crystal plane of the inorganic material is oriented parallel to the (0001) plane of the graphene. The crystal plane of the inorganic material has an atomic arrangement of a hexagon, a tetragon, or a pentagon.
Public/Granted literature
- US20110129675A1 MATERIAL INCLUDING GRAPHENE AND AN INORGANIC MATERIAL AND METHOD OF MANUFACTURING THE MATERIAL Public/Granted day:2011-06-02
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