Invention Grant
- Patent Title: Making multi-layer micro-wire structure
- Patent Title (中): 制作多层微线结构
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Application No.: US14261490Application Date: 2014-04-25
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Publication No.: US09296013B2Publication Date: 2016-03-29
- Inventor: Todd Mathew Spath , Ronald Steven Cok
- Applicant: Todd Mathew Spath , Ronald Steven Cok
- Applicant Address: US NY Rochester
- Assignee: EASTMAN KODAK COMPANY
- Current Assignee: EASTMAN KODAK COMPANY
- Current Assignee Address: US NY Rochester
- Agent Raymond L. Owens; Kevin E. Spaulding
- Main IPC: B05D5/12
- IPC: B05D5/12 ; B05D3/00 ; B05D3/12 ; B05D1/36 ; B05D1/38 ; H05K3/46 ; H05K3/42 ; H01B13/00 ; H01L21/768

Abstract:
A method of making a multi-layer micro-wire structure resistant to cracking on a substrate having a surface including forming a plurality of micro-channels in the substrate, locating a first electrically conductive material composition forming a first layer in each micro-channel, and locating a second electrically conductive material composition having a greater tensile ductility than the first material composition to form a second layer in each micro-channel and in electrical contact with the first electrically conductive material composition thereby providing an electrically conductive multi-layer micro-wire in each micro-channel that is resistant to cracking.
Public/Granted literature
- US20150310967A1 MAKING MULTI-LAYER MICRO-WIRE STRUCTURE Public/Granted day:2015-10-29
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