发明授权
US09281250B2 Method of detecting an asymmetric portion of an overlay mark and method of measuring an overlay including the same
有权
检测重叠标记的不对称部分的方法和测量包括其的覆盖物的方法
- 专利标题: Method of detecting an asymmetric portion of an overlay mark and method of measuring an overlay including the same
- 专利标题(中): 检测重叠标记的不对称部分的方法和测量包括其的覆盖物的方法
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申请号: US14539629申请日: 2014-11-12
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公开(公告)号: US09281250B2公开(公告)日: 2016-03-08
- 发明人: Seung-Hwa Oh , Jeong-Jin Lee , Chan Hwang
- 申请人: SAMSUNG ELECTRONICS CO., LTD.
- 申请人地址: KR Suwon-Si, Gyeonggi-Do
- 专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人地址: KR Suwon-Si, Gyeonggi-Do
- 代理机构: F. Chau & Associates, LLC
- 优先权: KR10-2014-0044655 20140415
- 主分类号: H01L21/66
- IPC分类号: H01L21/66 ; G01R31/26 ; G09G5/377 ; G06T7/00
摘要:
A method of detecting an asymmetric portion of an overlay mark includes forming a plurality of virtual overlay marks having a plurality of virtual asymmetric portions. The virtual asymmetric portions may have different sizes with respect to a reference model profile of a reference overlay mark. Virtual information with respect to each virtual overlay mark may be obtained. The virtual information of the virtual overlay marks may be compared with actual information of an actual overlay mark to identify virtual information of the virtual overlay mark corresponding to the actual information of the actual overlay mark. Thus, measuring the overlay of the actual overlay mark may be performed under than the actual asymmetric portion may be excluded from the actual overlay mark, so that the overlay may be accurately measured. As a result, errors may not be generated in a correcting process to a layer using the accurate overlay.
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