发明授权
- 专利标题: Insulation structure and insulation method
- 专利标题(中): 绝缘结构和绝缘方法
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申请号: US14291766申请日: 2014-05-30
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公开(公告)号: US09281160B2公开(公告)日: 2016-03-08
- 发明人: Masateru Sato
- 申请人: SEN Corporation
- 申请人地址: JP Tokyo
- 专利权人: Sumitomo Heavy Industries Ion Technology Co., Ltd.
- 当前专利权人: Sumitomo Heavy Industries Ion Technology Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Michael Best & Friedrich LLP
- 优先权: JP2013-115318 20130531
- 主分类号: H01J37/08
- IPC分类号: H01J37/08 ; H01J37/02 ; H01J27/02 ; H01J37/317
摘要:
An insulation structure provided among a plurality of electrodes for extraction of an ion beam from a plasma generating section is provided. The insulation structure includes an insulation member including a first part connected to a first electrode and a second part connected to a second electrode and configured to support the first electrode to the second electrode, a first cover surrounding at least a part of the first part to protect the first part from contamination particles, and a second cover surrounding at least a part of the second part to protect the second part from contamination particles. At least one of the first part and the second part is made of a machinable ceramic or a porous ceramic.
公开/授权文献
- US20140353518A1 INSULATION STRUCTURE AND INSULATION METHOD 公开/授权日:2014-12-04
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