发明授权
- 专利标题： Methods for promoting semiconductor manufacturing yield and classifying defects during fabricating a semiconductor device, and computer readable mediums encoded with a computer program implementing the same
- 专利标题（中）： 在制造半导体器件期间促进半导体制造产率和分类缺陷的方法以及用实现其的计算机程序编码的计算机可读介质
-
申请号： US13073405申请日： 2011-03-28
-
公开(公告)号： US09251581B1公开(公告)日： 2016-02-02
- 发明人: Shih-Tsung Chen , Wei Fang , Yu-Tsorng Fu , Futang Peng , Zhao-Li Zhang
- 申请人： Shih-Tsung Chen , Wei Fang , Yu-Tsorng Fu , Futang Peng , Zhao-Li Zhang
- 申请人地址： TW Hsinchu
- 专利权人： HERMES MICROVISION, INC.
- 当前专利权人： HERMES MICROVISION, INC.
- 当前专利权人地址： TW Hsinchu
- 代理机构： Huffman Law Group, PC
- 主分类号： G06T7/00
- IPC分类号： G06T7/00 ; G01N21/95
摘要：
A method for promoting semiconductor manufacturing yield comprising the following steps and a computer readable medium encoded with a computer program implementing the method is provided. First, a processed layer is inspected to generate an inspected image with defects thereon. Next, the inspected image is aligned to an original design layout information of the processed layer. In addition, the defects are classified according to geometric features of the original design layout information of the processed layer and at least previous one layer and/or at least next one layer.
信息查询
