Invention Grant
- Patent Title: Fluid extraction system, lithographic apparatus and device manufacturing method
- Patent Title (中): 流体萃取系统,光刻设备和装置制造方法
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Application No.: US14179276Application Date: 2014-02-12
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Publication No.: US09213246B2Publication Date: 2015-12-15
- Inventor: Nicolaas Rudolf Kemper , Robertus Nicodemus Jacobus Van Ballegoij , Marcus Martinus Petrus Adrianus Vermeulen , Michel Riepen , Martinus Wilhelmus Van Den Heuvel , Paul Petrus Joannes Berkvens , Christophe De Metsenaere , Jimmy Matheus Wilhelmus Van De Winkel , Cornelius Maria Rops
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03F7/20
- IPC: G03F7/20 ; F01N1/02

Abstract:
An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.
Public/Granted literature
- US20140300879A1 FLUID EXTRACTION SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2014-10-09
Information query
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