发明授权
- 专利标题: Method and apparatus for CMP conditioning
- 专利标题(中): CMP调理方法和装置
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申请号: US13785845申请日: 2013-03-05
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公开(公告)号: US09162344B2公开(公告)日: 2015-10-20
- 发明人: Rajeev Bajaj
- 申请人: Rajeev Bajaj
- 申请人地址: US CA Santa Clara
- 专利权人: APPLIED MATERIALS, INC.
- 当前专利权人: APPLIED MATERIALS, INC.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Patterson & Sheridan, LLP
- 主分类号: B24B1/00
- IPC分类号: B24B1/00 ; B24B53/017 ; B23K26/00 ; B24B53/095
摘要:
A polishing pad conditioning apparatus includes a laser beam generating unit for providing a laser beam, a fluid delivery system for providing a fluid stream and a vacuum line for removing debris. The laser beam may directly impinge on a surface of a polishing pad thereby creating cutting action, while an atomized fluid stream provides cooling and pad debris along with fluid are removed thru the vacuum line. Alternatively, the laser beam may be combined with the atomized fluid stream in a region above the pad surface to substantially impart part of its energy to the fluid stream, generating high energy droplets which provide “cool” cutting action on the pad surface.
公开/授权文献
- US20130189906A1 METHOD AND APPARATUS FOR CMP CONDITIONING 公开/授权日:2013-07-25
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