发明授权
- 专利标题: Beam monitor system and particle beam irradiation system
- 专利标题(中): 光束监测系统和粒子束照射系统
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申请号: US14548556申请日: 2014-11-20
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公开(公告)号: US09162081B2公开(公告)日: 2015-10-20
- 发明人: Yoshihito Hori , Takayoshi Matsushita , Kunio Moriyama , Masahiro Tadokoro
- 申请人: HITACHI, LTD.
- 申请人地址: JP Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Mattingly & Malur, PC
- 优先权: JP2013-248881 20131202
- 主分类号: H01J37/02
- IPC分类号: H01J37/02 ; A61N5/00 ; H01J29/41 ; A61N5/10 ; G01T1/29
摘要:
A beam monitor system having a simple configuration for improving a measurement precision specifying a position and the width. A beam monitor system, comprising collection electrodes that include a plurality of groups each having a plurality of adjacent wire electrodes, and detect an ionized particle beam passing therethrough, a first signal processing device that sets one wire electrode in the groups of the collection electrodes as a typical wire electrode, receives a detection signal output from the typical wire electrode to process the signal and a beam monitor controller that obtains a beam position of the ionized particle beam that has passed through the wire electrodes on the basis of a processed signal from the first signal processing device.
公开/授权文献
- US20150151140A1 BEAM MONITOR SYSTEM AND PARTICLE BEAM IRRADIATION SYSTEM 公开/授权日:2015-06-04
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