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US09153717B2 Backside illuminated photo-sensitive device with gradated buffer layer 有权
带渐变缓冲层的背面照明感光装置

Backside illuminated photo-sensitive device with gradated buffer layer
摘要：
A method for forming a backside illuminated photo-sensitive device includes forming a gradated sacrificial buffer layer onto a sacrificial substrate, forming a uniform layer onto the gradated sacrificial buffer layer, forming a second gradated buffer layer onto the uniform layer, forming a silicon layer onto the second gradated buffer layer, bonding a device layer to the silicon layer, and removing the gradated sacrificial buffer layer and the sacrificial substrate.
摘要（中）：

一种用于形成背面照射光敏装置的方法包括在牺牲衬底上形成渐变的牺牲缓冲层，在均匀的层上形成均匀的层，在均匀的层上形成第二渐变缓冲层，将硅层形成到 第二梯度缓冲层，将器件层结合到硅层，以及去除渐变的牺牲缓冲层和牺牲衬底。

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