发明授权
- 专利标题: Semiconductor apparatus comprised of two types of transistors
- 专利标题(中): 由两种晶体管构成的半导体装置
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申请号: US13904100申请日: 2013-05-29
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公开(公告)号: US09153573B2公开(公告)日: 2015-10-06
- 发明人: Fumio Yamada
- 申请人: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- 申请人地址: JP Osaka
- 专利权人: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- 当前专利权人: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- 当前专利权人地址: JP Osaka
- 代理机构: Smith, Gambrell & Russell LLP.
- 优先权: JP2012-123344 20120530
- 主分类号: H03F3/16
- IPC分类号: H03F3/16 ; H01L27/06 ; H01L25/00 ; H03F3/21 ; H03F1/02 ; H03F3/193 ; H03F3/24 ; H01L25/065 ; H01L25/18 ; H01L29/66 ; H01L29/778 ; H01L29/20 ; H01L23/00 ; H01L21/8252 ; H01L27/085
摘要:
A semiconductor apparatus that includes two types of transistors is disclosed. A first semiconductor chip includes the first semiconductor device of a transistor type of GaAs-HEMT, while, a second semiconductor chip includes a second semiconductor device of a transistor type GaN-HEMT. The second semiconductor device is formed on a SiC substrate, and the first semiconductor chip is mounted in an inactive region of the SiC substrate.
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