发明授权
US09149551B2 Plasma generating device, plasma generating method, and method for suppressing ozone generation
有权
等离子体发生装置,等离子体产生方法和抑制臭氧产生的方法
- 专利标题: Plasma generating device, plasma generating method, and method for suppressing ozone generation
- 专利标题(中): 等离子体发生装置,等离子体产生方法和抑制臭氧产生的方法
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申请号: US13884469申请日: 2011-11-09
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公开(公告)号: US09149551B2公开(公告)日: 2015-10-06
- 发明人: Kazutoshi Takenoshita , Makoto Miyamoto , Seiro Yuge , Yuki Kumagai , Yoko Nakayama , Hideo Nojima , Myung Chul Kim
- 申请人: Kazutoshi Takenoshita , Makoto Miyamoto , Seiro Yuge , Yuki Kumagai , Yoko Nakayama , Hideo Nojima , Myung Chul Kim
- 申请人地址: KR Suwon-Si
- 专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人地址: KR Suwon-Si
- 代理机构: Staas & Halsey LLP
- 优先权: JP2010-251168 20101109
- 国际申请: PCT/JP2011/075819 WO 20111109
- 国际公布: WO2012/063856 WO 20120518
- 主分类号: A61L2/00
- IPC分类号: A61L2/00 ; A62B7/08 ; B01J19/08 ; H05F3/00 ; A61L9/015 ; A61L9/22 ; H05H1/24
摘要:
The purpose of the present invention is to minimize ozone production while increasing the production of an active species. The plasma generating device (100) comprises: a pair of electrodes (21, 22) in which dielectric films (21a, 21b) are disposed on at least one opposing face; voltage application means (4) for applying a pulse voltage across the electrodes (21, 22) to bring about a plasma discharger; and fluid circulation holes (21b, 22b) that are disposed in locations corresponding to the electrodes (21, 22), respectively, and that are configured to pass entirely therethrough. The plasma generating device is also configured such that a fluid passing through the fluid circulation holes (21b, 22b) comes into contact with the plasma, generating ions or radicals, wherein the voltage applying means (4) varies the peak value and/or the pulse width of the pulse voltage applied across the electrodes (21, 22).
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