Invention Grant
- Patent Title: Deposition apparatus, method of forming thin film using the deposition apparatus, and method of manufacturing organic light emitting display apparatus using the deposition apparatus
- Patent Title (中): 沉积装置，使用沉积装置形成薄膜的方法，以及使用沉积装置制造有机发光显示装置的方法
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Application No.: US14269175Application Date: 2014-05-04
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Publication No.: US09142415B2Publication Date: 2015-09-22
- Inventor: Myung-Soo Huh , Suk-Won Jung , Sung-Chul Kim , Sang-Hyuk Hong , Choel-Min Jang
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2013-0088265 20130725
- Main IPC: H01L21/285
- IPC: H01L21/285 ; H01L21/02 ; H01L51/56 ; H01L51/00
Abstract:
A deposition apparatus for performing a deposition process on a substrate includes: an injection unit including a plasma generating member which receives a raw material gas and converts the raw material gas to a deposition source material in a radical form; and a plasma processor disposed adjacent to the injection unit and facing a side of the injection unit, wherein the plasma processor performs a plasma process in a direction facing the substrate.
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Information query
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