发明授权
- 专利标题: Photoreceptor with improved blocking layer
- 专利标题(中): 光感受器具有改进的阻挡层
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申请号: US13554886申请日: 2012-07-20
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公开(公告)号: US09123842B2公开(公告)日: 2015-09-01
- 发明人: Bahman Hekmatshoartabari , Jeehwan Kim , Devendra K. Sadana , Ghavam G. Shahidi , Davood Shahrjerdi
- 申请人: Bahman Hekmatshoartabari , Jeehwan Kim , Devendra K. Sadana , Ghavam G. Shahidi , Davood Shahrjerdi
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理机构: Otterstedt, Ellenbogen & Kammer, LLP
- 代理商 Louis J. Percello, Esq.
- 主分类号: H01L21/00
- IPC分类号: H01L21/00 ; H01L31/0352 ; H01L31/103 ; B82Y20/00
摘要:
A photoreceptor includes a multilayer blocking structure to reduce dark discharge of the surface voltage of the photoreceptor resulting from electron injection from an electrically conductive substrate. The multilayer blocking structure includes wide band gap semiconductor layers in alternating sequence with one or more narrow band gap blocking layers. A fabrication method of the photoreceptor includes transfer-doping of the narrow band gap blocking layers, which are deposited in alternating sequence with wide band gap semiconductor layers to form a blocking structure. Suppression of hole or electron injection can be obtained using the method.
公开/授权文献
- US20130344644A1 PHOTORECEPTOR WITH IMPROVED BLOCKING LAYER 公开/授权日:2013-12-26
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