发明授权
- 专利标题: Processing apparatus and device manufacturing method
- 专利标题(中): 加工装置及装置的制造方法
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申请号: US13865911申请日: 2013-04-18
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公开(公告)号: US09123760B2公开(公告)日: 2015-09-01
- 发明人: Shinichi Hirano , Mitsuji Marumo
- 申请人: CANON KABUSHIKI KAISHA
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Canon U.S.A., Inc. IP Division
- 优先权: JP2008-197125 20080731
- 主分类号: H01L21/677
- IPC分类号: H01L21/677 ; G03B27/58
摘要:
A processing apparatus of the present invention processes for a wafer. The processing apparatus includes an XY stage which includes a wafer chuck which holds the wafer and an elevating device which rises relative to the wafer chuck to hold the wafer, and a wafer conveying robot hand which conveys the wafer from the XY stage at a wafer transfer position. The XY stage moves to change a direction at an angle between degree and degree via the wafer transfer position in a state where the elevating device rises relative to the wafer chuck. The wafer conveying robot hand has a shape which does not interfere with the XY stage which moves to change the direction at the angle when the wafer conveying hand is positioned at the wafer transfer position.
公开/授权文献
- US20130230371A1 PROCESSING APPARATUS AND DEVICE MANUFACTURING METHOD 公开/授权日:2013-09-05
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