Invention Grant
- Patent Title: Liquid ejection head and method of manufacturing same
- Patent Title (中): 液体喷头及其制造方法
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Application No.: US13746695Application Date: 2013-01-22
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Publication No.: US09096063B2Publication Date: 2015-08-04
- Inventor: Masahiko Kubota , Ken Tsuchii , Masataka Sakurai , Yoshiyuki Nakagawa , Akiko Saito , Shinji Kishikawa , Ryoji Kanri , Atsunori Terasaki , Akihiko Okano , Atsushi Hiramoto
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon USA Inc IP Division
- Priority: JP2012-011857 20120124
- Main IPC: B41J2/14
- IPC: B41J2/14 ; B41J2/16

Abstract:
A method of manufacturing a liquid ejection head includes the steps of (1) forming a recess in a second surface of a substrate to form a common supply port, (2) forming an etching mask, which specifies opening positions of independent supply ports, on a bottom surface of the common supply port, and (3) performing ion etching using plasma with the etching mask employed as a mask, thereby forming the independent supply ports. The etching mask has an opening pattern formed therein such that respective distances from an ejection energy generation element to openings of two independent supply ports adjacent to the ejection energy generation element on the first surface side of the substrate are equal to each other.
Public/Granted literature
- US20130187987A1 LIQUID EJECTION HEAD AND METHOD OF MANUFACTURING SAME Public/Granted day:2013-07-25
Information query
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