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发明授权
US09005870B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition 有权
光化学射线或辐射敏感性树脂组合物和使用该组合物形成图案的方法

Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition
摘要：
According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin (P) containing a repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and at least two types of repeating units B1), (B2) that when acted on by an acid, are decomposed to thereby generate an alkali-soluble group, wherein the alkali-soluble group generated by the repeating unit (B1) is different from the alkali-soluble group generated by the repeating unit (B2).
摘要（中）：

根据一个实施方案，光化射线或辐射敏感性树脂组合物包括含有重复单元（A）的树脂（P），其在暴露于光化射线或辐射时被分解，从而产生酸和至少两种类型 重复单元B1），（B2），当被酸作用时分解，从而产生碱溶性基团，其中由重复单元（B1）产生的碱溶性基团不同于碱溶性基团 由重复单元（B2）生成。

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