发明授权
- 专利标题: Layer-by-layer removal of graphene
- 专利标题(中): 逐层去除石墨烯
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申请号: US13878876申请日: 2011-10-11
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公开(公告)号: US09005460B2公开(公告)日: 2015-04-14
- 发明人: James M. Tour , Ayrat M. Dimiev , Dmitry V. Kosynkin
- 申请人: James M. Tour , Ayrat M. Dimiev , Dmitry V. Kosynkin
- 申请人地址: US TX Houston
- 专利权人: William Marsh Rice University
- 当前专利权人: William Marsh Rice University
- 当前专利权人地址: US TX Houston
- 代理机构: Winstead PC
- 国际申请: PCT/US2011/055747 WO 20111011
- 国际公布: WO2012/094045 WO 20120712
- 主分类号: C03C25/68
- IPC分类号: C03C25/68 ; C01B31/04 ; H01L21/306 ; H01L21/308 ; B82Y30/00 ; B82Y40/00
摘要:
The present invention provides methods of selectively removing one or more graphene layers from a graphene material by: (1) applying a metal to a surface of the graphene material; and (2) applying a hydrogen containing solution to the surface of the graphene material that is associated with the metal. The hydrogen containing solution dissolves the metal along with one or more layers of graphene associated with the metal, thereby removing the layer(s) of graphene from the graphene material. In some embodiments, the hydrogen containing solution is an acidic solution, such as hydrochloric acid. In some embodiments, the metal is zinc. In some embodiments, the methods of the present invention are utilized to selectively remove one or more layers of graphene from one or more targeted sites on the surface of a graphene material.
公开/授权文献
- US20130319973A1 LAYER-BY-LAYER REMOVAL OF GRAPHENE 公开/授权日:2013-12-05
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