Invention Grant
US09004002B2 Mask assembly having a plurality of projections at a boundary of adjacent two deposition masks
有权
掩模组件在相邻的两个沉积掩模的边界处具有多个突起
- Patent Title: Mask assembly having a plurality of projections at a boundary of adjacent two deposition masks
- Patent Title (中): 掩模组件在相邻的两个沉积掩模的边界处具有多个突起
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Application No.: US12978831Application Date: 2010-12-27
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Publication No.: US09004002B2Publication Date: 2015-04-14
- Inventor: Chong-Hyun Park , Tae-Hyung Kim , Il-Hyun Lee
- Applicant: Chong-Hyun Park , Tae-Hyung Kim , Il-Hyun Lee
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge LLP
- Priority: KR10-2010-0009849 20100203
- Main IPC: C23C14/04
- IPC: C23C14/04 ; B05C21/00 ; C23C16/04 ; H01L51/00 ; B05C11/00 ; B05D1/32
Abstract:
A mask assembly is disclosed to improve organic material deposition efficiency including: a plurality of deposition masks, at least one of opposite ends of each of the plurality of deposition masks is formed to have a plurality of projections, which form at least one boundary aperture region at a boundary of adjacent two deposition masks.
Public/Granted literature
- US20110185965A1 MASK ASSEMBLY Public/Granted day:2011-08-04
Information query
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