Invention Grant
- Patent Title: Semiconductor photocatalyst coated with graphitic carbon film and method of fabricating the same
- Patent Title (中): 用石墨碳膜涂覆的半导体光催化剂及其制造方法
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Application No.: US13708813Application Date: 2012-12-07
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Publication No.: US08987164B2Publication Date: 2015-03-24
- Inventor: Jeung-Ku Kang , Dong-Ki Lee , Kyu-Sung Han , Weon-Ho Shin , Jung-Woo Lee , Jung-Hoon Choi , Kyung-Min Choi , Yeob Lee
- Applicant: Korea Advanced Institute of Science and Technology
- Applicant Address: KR Daejeon
- Assignee: Korea Advanced Institute of Science and Technology
- Current Assignee: Korea Advanced Institute of Science and Technology
- Current Assignee Address: KR Daejeon
- Agency: Sterne, Kessler, Goldstein & Fox, P.L.L.C.
- Priority: KR10-2012-0078747 20120719
- Main IPC: B01J21/18
- IPC: B01J21/18 ; B01J23/00 ; H01B1/02 ; H01B1/06 ; H05B7/085 ; H01L21/02 ; H01L29/06 ; H01L51/00

Abstract:
A semiconductor of which a substance such as a semiconductor photocatalyst is uniformly coated on the surface thereof with a graphitic carbon film and a method of fabricating the same are disclosed. According to the inventive method, a graphitic carbon film having a thickness of 1 nm or less is uniformly formed on the surface of the semiconductor by performing hydrothermal synthesis and pyrolysis on glucose, so as to keep the original structure crystallinity of the semiconductor photocatalyst to be a support of the carbon film.
Public/Granted literature
- US20140021589A1 Semiconductor Photocatalyst Coated with Graphitic Carbon Film and Method of Fabricating the Same Public/Granted day:2014-01-23
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