Invention Grant
- Patent Title: Multilayer component and production method
- Patent Title (中): 多层成分及生产方法
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Application No.: US13201173Application Date: 2010-02-08
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Publication No.: US08970324B2Publication Date: 2015-03-03
- Inventor: Pavol Dudesek , Guenter Pudmich , Hannes Schiechl , Edmund Payr , Thomas Feichtinger , Werner Salz , Christian Hoffmann
- Applicant: Pavol Dudesek , Guenter Pudmich , Hannes Schiechl , Edmund Payr , Thomas Feichtinger , Werner Salz , Christian Hoffmann
- Applicant Address: DE Munich
- Assignee: Epcos AG
- Current Assignee: Epcos AG
- Current Assignee Address: DE Munich
- Agency: Slater & Matsil, L.L.P.
- Priority: DE102009008737 20090212; DE102009014542 20090324
- International Application: PCT/EP2010/051518 WO 20100208
- International Announcement: WO2010/092027 WO 20100819
- Main IPC: H01G4/12
- IPC: H01G4/12 ; H01C7/18 ; B32B18/00 ; C04B35/453 ; C04B35/495 ; H03H1/00

Abstract:
A multilayer component includes a dielectric ceramic material that can be co-sintered with a varistor ceramic to form a monolithic multilayer component according to the invention. The multilayer component therefore includes a layer of a varistor ceramic and another layer of a dielectric. Both layers can be arranged directly adjacent to one another in the multilayer component. In the multilayer component, metallizations are arranged on or between the ceramic layers. The metallizations are structured to form conductor sections and metallized areas. The metallizations form together with the ceramic layers alongside a varistor at least one further component selected from at least one of the component functions.
Public/Granted literature
- US20120032757A1 Multilayer Component and Production Method Public/Granted day:2012-02-09
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