Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
- Patent Title (中): 平版印刷设备和器件制造方法
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Application No.: US13226103Application Date: 2011-09-06
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Publication No.: US08947637B2Publication Date: 2015-02-03
- Inventor: Timotheus Franciscus Sengers , Marcus Adrianus Van De Kerkhof , Mark Kroon , Kees Van Weert
- Applicant: Timotheus Franciscus Sengers , Marcus Adrianus Van De Kerkhof , Mark Kroon , Kees Van Weert
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP03255395 20030829
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03F9/00 ; G03F7/20
Abstract:
A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
Public/Granted literature
- US20110317143A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2011-12-29
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