Invention Grant
- Patent Title: Storage element for STT MRAM applications
- Patent Title (中): STT MRAM应用的存储元件
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Application No.: US13617432Application Date: 2012-09-14
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Publication No.: US08921961B2Publication Date: 2014-12-30
- Inventor: Witold Kula , Guenole Jan , Ru-Ying Tong , Yu-Jen Wang
- Applicant: Witold Kula , Guenole Jan , Ru-Ying Tong , Yu-Jen Wang
- Applicant Address: US CA Milpitas
- Assignee: Headway Technologies, Inc.
- Current Assignee: Headway Technologies, Inc.
- Current Assignee Address: US CA Milpitas
- Agency: Saile Ackerman LLC
- Agent Stephen B. Ackerman
- Main IPC: H01L29/82
- IPC: H01L29/82 ; H01L21/02 ; H01L21/00

Abstract:
An improved PMA STT MTJ storage element, and a method for forming it, are described. By inserting a suitable oxide layer between the storage and cap layers, improved PMA properties are obtained, increasing the potential for a larger Eb/kT thermal factor as well as a larger MR. Another important advantage is better compatibility with high processing temperatures, potentially facilitating integration with CMOS.
Public/Granted literature
- US20140077318A1 Storage Element for STT MRAM Applications Public/Granted day:2014-03-20
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