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US08921961B2 Storage element for STT MRAM applications 有权
STT MRAM应用的存储元件

Storage element for STT MRAM applications
Abstract:
An improved PMA STT MTJ storage element, and a method for forming it, are described. By inserting a suitable oxide layer between the storage and cap layers, improved PMA properties are obtained, increasing the potential for a larger Eb/kT thermal factor as well as a larger MR. Another important advantage is better compatibility with high processing temperatures, potentially facilitating integration with CMOS.
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